Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction
Atomically thin lubrication materials with anti-friction properties are crucial for reducing energy consumption and extending the service life of micro/nanoelectromechanical systems (MEMS/NEMS). However, achieving atomically thin films with ultra-low friction properties at the atomic/nanoscale even...
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| Format: | Article |
| Language: | English |
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Tsinghua University Press
2025-04-01
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| Series: | Friction |
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| Online Access: | https://www.sciopen.com/article/10.26599/FRICT.2025.9440936 |
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| author | Xinjian He Tongtong Yu Zishuai Wu Changhe Du Haoyu Deng Yongkang Zhao Shuang Li Yange Feng Liqiang Zhang Zhinan Zhang Daoai Wang |
| author_facet | Xinjian He Tongtong Yu Zishuai Wu Changhe Du Haoyu Deng Yongkang Zhao Shuang Li Yange Feng Liqiang Zhang Zhinan Zhang Daoai Wang |
| author_sort | Xinjian He |
| collection | DOAJ |
| description | Atomically thin lubrication materials with anti-friction properties are crucial for reducing energy consumption and extending the service life of micro/nanoelectromechanical systems (MEMS/NEMS). However, achieving atomically thin films with ultra-low friction properties at the atomic/nanoscale even at the micrometer scale presents significant challenges. In this study, large-size and high-quality monolayer MoS2 (ML MoS2) was grown on SiO2/Si substrate by chemical vapor deposition (CVD) method. Compared with mechanically exfoliated ML MoS2, the CVD-grown ML MoS2 (CVD-MoS2) exhibits an ultra-lower friction coefficient (0.00904). Based on the stick–slip effect and Prandtl–Tomlinson (P–T) model, the reduction of puckering effect indicates stronger interaction and lower interface potential barrier in tip, CVD-MoS2, and SiO2/Si substrate system. Moreover, combining with the density functional theory calculations, the stronger interface adhesion and higher overall charge redistribution degree of CVD-MoS2 can also be used to explain its ultralow friction state. This work will provide theoretical guidance for designing ultra-thin lubricating materials with ultra-low friction properties. |
| format | Article |
| id | doaj-art-1fc03a5d2ee14667a3ab4c3ddb151e45 |
| institution | OA Journals |
| issn | 2223-7690 2223-7704 |
| language | English |
| publishDate | 2025-04-01 |
| publisher | Tsinghua University Press |
| record_format | Article |
| series | Friction |
| spelling | doaj-art-1fc03a5d2ee14667a3ab4c3ddb151e452025-08-20T01:47:54ZengTsinghua University PressFriction2223-76902223-77042025-04-01134944093610.26599/FRICT.2025.9440936Atomically thin MoS2 with ultra-low friction properties based on strong interface interactionXinjian He0Tongtong Yu1Zishuai Wu2Changhe Du3Haoyu Deng4Yongkang Zhao5Shuang Li6Yange Feng7Liqiang Zhang8Zhinan Zhang9Daoai Wang10State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaState Key Laboratory of Mechanical System and Vibration, Shanghai Jiao Tong University, Shanghai 200240, ChinaState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaState Key Laboratory of Mechanical System and Vibration, Shanghai Jiao Tong University, Shanghai 200240, ChinaState Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, ChinaAtomically thin lubrication materials with anti-friction properties are crucial for reducing energy consumption and extending the service life of micro/nanoelectromechanical systems (MEMS/NEMS). However, achieving atomically thin films with ultra-low friction properties at the atomic/nanoscale even at the micrometer scale presents significant challenges. In this study, large-size and high-quality monolayer MoS2 (ML MoS2) was grown on SiO2/Si substrate by chemical vapor deposition (CVD) method. Compared with mechanically exfoliated ML MoS2, the CVD-grown ML MoS2 (CVD-MoS2) exhibits an ultra-lower friction coefficient (0.00904). Based on the stick–slip effect and Prandtl–Tomlinson (P–T) model, the reduction of puckering effect indicates stronger interaction and lower interface potential barrier in tip, CVD-MoS2, and SiO2/Si substrate system. Moreover, combining with the density functional theory calculations, the stronger interface adhesion and higher overall charge redistribution degree of CVD-MoS2 can also be used to explain its ultralow friction state. This work will provide theoretical guidance for designing ultra-thin lubricating materials with ultra-low friction properties.https://www.sciopen.com/article/10.26599/FRICT.2025.9440936chemical vapor deposition (cvd)mos2ultra-thinultra-low frictioninterface interaction |
| spellingShingle | Xinjian He Tongtong Yu Zishuai Wu Changhe Du Haoyu Deng Yongkang Zhao Shuang Li Yange Feng Liqiang Zhang Zhinan Zhang Daoai Wang Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction Friction chemical vapor deposition (cvd) mos2 ultra-thin ultra-low friction interface interaction |
| title | Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction |
| title_full | Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction |
| title_fullStr | Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction |
| title_full_unstemmed | Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction |
| title_short | Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction |
| title_sort | atomically thin mos2 with ultra low friction properties based on strong interface interaction |
| topic | chemical vapor deposition (cvd) mos2 ultra-thin ultra-low friction interface interaction |
| url | https://www.sciopen.com/article/10.26599/FRICT.2025.9440936 |
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