Atomically thin MoS2 with ultra-low friction properties based on strong interface interaction
Atomically thin lubrication materials with anti-friction properties are crucial for reducing energy consumption and extending the service life of micro/nanoelectromechanical systems (MEMS/NEMS). However, achieving atomically thin films with ultra-low friction properties at the atomic/nanoscale even...
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| Main Authors: | , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Tsinghua University Press
2025-04-01
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| Series: | Friction |
| Subjects: | |
| Online Access: | https://www.sciopen.com/article/10.26599/FRICT.2025.9440936 |
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| Summary: | Atomically thin lubrication materials with anti-friction properties are crucial for reducing energy consumption and extending the service life of micro/nanoelectromechanical systems (MEMS/NEMS). However, achieving atomically thin films with ultra-low friction properties at the atomic/nanoscale even at the micrometer scale presents significant challenges. In this study, large-size and high-quality monolayer MoS2 (ML MoS2) was grown on SiO2/Si substrate by chemical vapor deposition (CVD) method. Compared with mechanically exfoliated ML MoS2, the CVD-grown ML MoS2 (CVD-MoS2) exhibits an ultra-lower friction coefficient (0.00904). Based on the stick–slip effect and Prandtl–Tomlinson (P–T) model, the reduction of puckering effect indicates stronger interaction and lower interface potential barrier in tip, CVD-MoS2, and SiO2/Si substrate system. Moreover, combining with the density functional theory calculations, the stronger interface adhesion and higher overall charge redistribution degree of CVD-MoS2 can also be used to explain its ultralow friction state. This work will provide theoretical guidance for designing ultra-thin lubricating materials with ultra-low friction properties. |
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| ISSN: | 2223-7690 2223-7704 |