APA (7th ed.) Citation

Hussin, H., Soin, N., Bukhori, M. F., Hatta, S. W. M., & Wahab, Y. A. Effects of Gate Stack Structural and Process Defectivity on High-k Dielectric Dependence of NBTI Reliability in 32 nm Technology Node PMOSFETs. Wiley.

Chicago Style (17th ed.) Citation

Hussin, H., N. Soin, M. F. Bukhori, S. Wan Muhamad Hatta, and Y. Abdul Wahab. Effects of Gate Stack Structural and Process Defectivity on High-k Dielectric Dependence of NBTI Reliability in 32 nm Technology Node PMOSFETs. Wiley.

MLA (9th ed.) Citation

Hussin, H., et al. Effects of Gate Stack Structural and Process Defectivity on High-k Dielectric Dependence of NBTI Reliability in 32 nm Technology Node PMOSFETs. Wiley.