Quan, Z., Guoyou, L., & Jianwei, H. Effect of Oxidation Temperature and Chlorine Source on the Gate Oxidation Process for High Power IGBT. Editorial Office of Control and Information Technology.
Chicago Style (17th ed.) CitationQuan, ZHANG, LIU Guoyou, and HUANG Jianwei. Effect of Oxidation Temperature and Chlorine Source on the Gate Oxidation Process for High Power IGBT. Editorial Office of Control and Information Technology.
MLA (9th ed.) CitationQuan, ZHANG, et al. Effect of Oxidation Temperature and Chlorine Source on the Gate Oxidation Process for High Power IGBT. Editorial Office of Control and Information Technology.
Warning: These citations may not always be 100% accurate.