Analysis of the Spatial-Frequency Characteristics of the Photo-Assisted Method of a Quartz Rough Surface Nano-Polishing
The relationship between the spatial-frequency parameters of a rough surface with a random profile, which has a Gaussian form of the correlation function, and the amplitude-frequency characteristics of the electric field created by this surface is determined. The numerical determination of the evane...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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Wiley
2021-01-01
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| Series: | International Journal of Optics |
| Online Access: | http://dx.doi.org/10.1155/2021/8773864 |
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| author | Vasyl Kanevskii Serhii Kolienov Valerii Grygoruk Oleksandr Stelmakh Hao Zhang |
| author_facet | Vasyl Kanevskii Serhii Kolienov Valerii Grygoruk Oleksandr Stelmakh Hao Zhang |
| author_sort | Vasyl Kanevskii |
| collection | DOAJ |
| description | The relationship between the spatial-frequency parameters of a rough surface with a random profile, which has a Gaussian form of the correlation function, and the amplitude-frequency characteristics of the electric field created by this surface is determined. The numerical determination of the evanescent field optimal configuration formed near the quartz rough surface in the gaseous medium saturated with chlorine molecules when illuminated from the quartz side has been considered. The finite-element approach is used to solve the Helmholtz two-dimensional vector equation. It was found that at the initial stage of photochemical polishing different electrodynamic conditions are created for the etching process depending on the profile height standard deviation value. In particular, when the standard deviation is less than 1 nm, all surface protrusions, for which the spatial spectrum harmonics of the profile are located in the region of the maximum slope of the spectral function, are most actively etched. This leads to a decrease in the effective width of the spatial spectrum of a rough quartz surface and an increase in its correlation length. Therefore, simultaneously with decreasing the height of the protrusions, the surface becomes flatter. The paper shows the different character of quartz surface nano-polishing process conditions depending on the initial standard deviation of the profile height. |
| format | Article |
| id | doaj-art-10754c734c1a4c5b828bc9afb7c5af8f |
| institution | Kabale University |
| issn | 1687-9384 1687-9392 |
| language | English |
| publishDate | 2021-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Optics |
| spelling | doaj-art-10754c734c1a4c5b828bc9afb7c5af8f2025-02-03T07:23:30ZengWileyInternational Journal of Optics1687-93841687-93922021-01-01202110.1155/2021/87738648773864Analysis of the Spatial-Frequency Characteristics of the Photo-Assisted Method of a Quartz Rough Surface Nano-PolishingVasyl Kanevskii0Serhii Kolienov1Valerii Grygoruk2Oleksandr Stelmakh3Hao Zhang4Chuiko Institute of Surface Chemistry, NAS of Ukraine, Kyiv 03164, UkraineTaras Shevchenko National University of Kyiv, Kyiv 01601, UkraineTaras Shevchenko National University of Kyiv, Kyiv 01601, UkraineBeijing Institute of Technology, Beijing 100081, ChinaBeijing Institute of Technology, Beijing 100081, ChinaThe relationship between the spatial-frequency parameters of a rough surface with a random profile, which has a Gaussian form of the correlation function, and the amplitude-frequency characteristics of the electric field created by this surface is determined. The numerical determination of the evanescent field optimal configuration formed near the quartz rough surface in the gaseous medium saturated with chlorine molecules when illuminated from the quartz side has been considered. The finite-element approach is used to solve the Helmholtz two-dimensional vector equation. It was found that at the initial stage of photochemical polishing different electrodynamic conditions are created for the etching process depending on the profile height standard deviation value. In particular, when the standard deviation is less than 1 nm, all surface protrusions, for which the spatial spectrum harmonics of the profile are located in the region of the maximum slope of the spectral function, are most actively etched. This leads to a decrease in the effective width of the spatial spectrum of a rough quartz surface and an increase in its correlation length. Therefore, simultaneously with decreasing the height of the protrusions, the surface becomes flatter. The paper shows the different character of quartz surface nano-polishing process conditions depending on the initial standard deviation of the profile height.http://dx.doi.org/10.1155/2021/8773864 |
| spellingShingle | Vasyl Kanevskii Serhii Kolienov Valerii Grygoruk Oleksandr Stelmakh Hao Zhang Analysis of the Spatial-Frequency Characteristics of the Photo-Assisted Method of a Quartz Rough Surface Nano-Polishing International Journal of Optics |
| title | Analysis of the Spatial-Frequency Characteristics of the Photo-Assisted Method of a Quartz Rough Surface Nano-Polishing |
| title_full | Analysis of the Spatial-Frequency Characteristics of the Photo-Assisted Method of a Quartz Rough Surface Nano-Polishing |
| title_fullStr | Analysis of the Spatial-Frequency Characteristics of the Photo-Assisted Method of a Quartz Rough Surface Nano-Polishing |
| title_full_unstemmed | Analysis of the Spatial-Frequency Characteristics of the Photo-Assisted Method of a Quartz Rough Surface Nano-Polishing |
| title_short | Analysis of the Spatial-Frequency Characteristics of the Photo-Assisted Method of a Quartz Rough Surface Nano-Polishing |
| title_sort | analysis of the spatial frequency characteristics of the photo assisted method of a quartz rough surface nano polishing |
| url | http://dx.doi.org/10.1155/2021/8773864 |
| work_keys_str_mv | AT vasylkanevskii analysisofthespatialfrequencycharacteristicsofthephotoassistedmethodofaquartzroughsurfacenanopolishing AT serhiikolienov analysisofthespatialfrequencycharacteristicsofthephotoassistedmethodofaquartzroughsurfacenanopolishing AT valeriigrygoruk analysisofthespatialfrequencycharacteristicsofthephotoassistedmethodofaquartzroughsurfacenanopolishing AT oleksandrstelmakh analysisofthespatialfrequencycharacteristicsofthephotoassistedmethodofaquartzroughsurfacenanopolishing AT haozhang analysisofthespatialfrequencycharacteristicsofthephotoassistedmethodofaquartzroughsurfacenanopolishing |