Wet Anisotropic Etching Characteristics of Si{111} in KOH-Based Solution

Wet Anisotropic Etching Characteristics of Si{111} in KOH-Based Solution

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Bibliographic Details
Main Authors:	Xiezheng Yu, Yinghua Ye, Peng Zhu, Lizhi Wu, Ruiqi Shen, Chen-guang Zhu
Format:	Article
Language:	English
Published:	American Chemical Society 2025-01-01
Series:	ACS Omega
Online Access:	https://doi.org/10.1021/acsomega.4c09272
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