Yu, X., Ye, Y., Zhu, P., Wu, L., Shen, R., & Zhu, C. Wet Anisotropic Etching Characteristics of Si{111} in KOH-Based Solution. American Chemical Society.
Chicago Style (17th ed.) CitationYu, Xiezheng, Yinghua Ye, Peng Zhu, Lizhi Wu, Ruiqi Shen, and Chen-guang Zhu. Wet Anisotropic Etching Characteristics of Si{111} in KOH-Based Solution. American Chemical Society.
MLA (9th ed.) CitationYu, Xiezheng, et al. Wet Anisotropic Etching Characteristics of Si{111} in KOH-Based Solution. American Chemical Society.
Warning: These citations may not always be 100% accurate.