TiO2 thin film synthesis from complex precursors by CVD, its physical and photocatalytic properties
Photocatalytic TiO2 films on glass and quartz plates were obtained by the chemical vapour deposition using Ti(dpm)2(Opri)2 complex compound (CC-CVD method) in a standard vacuum apparatus at 1.2–2.0 × 10-4 mbar. The substrate temperature was stabilised in the range of 450–600 ∘C. The growth rate vari...
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| Format: | Article |
| Language: | English |
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Wiley
2003-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/S1110662X03000205 |
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| author | V. G. Besserguenev R. J.F. Pereira M. C. Mateus I. V. Khmelinskii R. C. Nicula E. Burkel |
| author_facet | V. G. Besserguenev R. J.F. Pereira M. C. Mateus I. V. Khmelinskii R. C. Nicula E. Burkel |
| author_sort | V. G. Besserguenev |
| collection | DOAJ |
| description | Photocatalytic TiO2 films on glass and quartz plates were obtained by the chemical vapour
deposition using Ti(dpm)2(Opri)2 complex compound (CC-CVD method) in a standard vacuum apparatus
at 1.2–2.0 × 10-4 mbar. The substrate temperature was stabilised in the range of 450–600 ∘C. The growth rate varied from several nanometres to several dozen of nanometres per minute. Structural information on
TiO2 thin films was obtained from synchrotron radiation experiments. High-resolution grazing incidence
X-ray diffraction (GIXRD) experiments were performed at the high-resolution powder diffractometer at the
DESY/HASYLAB beamline B2 (Hamburg, Germany). Thin films deposited on either single-crystal Si wafers
or on amorphous quartz substrates were analysed. The photocatalytic activity of the TiO2 thin films was
studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its
degradation kinetics was followed by High-Performance Liquid Chromatography (HPLC). |
| format | Article |
| id | doaj-art-09b6ed80914241c1a581062e8c4dfdf6 |
| institution | Kabale University |
| issn | 1110-662X |
| language | English |
| publishDate | 2003-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Photoenergy |
| spelling | doaj-art-09b6ed80914241c1a581062e8c4dfdf62025-02-03T06:01:37ZengWileyInternational Journal of Photoenergy1110-662X2003-01-01529910510.1155/S1110662X03000205TiO2 thin film synthesis from complex precursors by CVD, its physical and photocatalytic propertiesV. G. Besserguenev0R. J.F. Pereira1M. C. Mateus2I. V. Khmelinskii3R. C. Nicula4E. Burkel5Algarve University, Campus de Gambelas, Faro 8000-117, PortugalAlgarve University, Campus de Gambelas, Faro 8000-117, PortugalAlgarve University, Campus de Gambelas, Faro 8000-117, PortugalAlgarve University, Campus de Gambelas, Faro 8000-117, PortugalUniversity of Rostock, FB Physik, August-Bebel-Str. 55, Rostock 18055, GermanyUniversity of Rostock, FB Physik, August-Bebel-Str. 55, Rostock 18055, GermanyPhotocatalytic TiO2 films on glass and quartz plates were obtained by the chemical vapour deposition using Ti(dpm)2(Opri)2 complex compound (CC-CVD method) in a standard vacuum apparatus at 1.2–2.0 × 10-4 mbar. The substrate temperature was stabilised in the range of 450–600 ∘C. The growth rate varied from several nanometres to several dozen of nanometres per minute. Structural information on TiO2 thin films was obtained from synchrotron radiation experiments. High-resolution grazing incidence X-ray diffraction (GIXRD) experiments were performed at the high-resolution powder diffractometer at the DESY/HASYLAB beamline B2 (Hamburg, Germany). Thin films deposited on either single-crystal Si wafers or on amorphous quartz substrates were analysed. The photocatalytic activity of the TiO2 thin films was studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its degradation kinetics was followed by High-Performance Liquid Chromatography (HPLC).http://dx.doi.org/10.1155/S1110662X03000205 |
| spellingShingle | V. G. Besserguenev R. J.F. Pereira M. C. Mateus I. V. Khmelinskii R. C. Nicula E. Burkel TiO2 thin film synthesis from complex precursors by CVD, its physical and photocatalytic properties International Journal of Photoenergy |
| title | TiO2 thin film synthesis from complex precursors by CVD, its physical and photocatalytic properties |
| title_full | TiO2 thin film synthesis from complex precursors by CVD, its physical and photocatalytic properties |
| title_fullStr | TiO2 thin film synthesis from complex precursors by CVD, its physical and photocatalytic properties |
| title_full_unstemmed | TiO2 thin film synthesis from complex precursors by CVD, its physical and photocatalytic properties |
| title_short | TiO2 thin film synthesis from complex precursors by CVD, its physical and photocatalytic properties |
| title_sort | tio2 thin film synthesis from complex precursors by cvd its physical and photocatalytic properties |
| url | http://dx.doi.org/10.1155/S1110662X03000205 |
| work_keys_str_mv | AT vgbesserguenev tio2thinfilmsynthesisfromcomplexprecursorsbycvditsphysicalandphotocatalyticproperties AT rjfpereira tio2thinfilmsynthesisfromcomplexprecursorsbycvditsphysicalandphotocatalyticproperties AT mcmateus tio2thinfilmsynthesisfromcomplexprecursorsbycvditsphysicalandphotocatalyticproperties AT ivkhmelinskii tio2thinfilmsynthesisfromcomplexprecursorsbycvditsphysicalandphotocatalyticproperties AT rcnicula tio2thinfilmsynthesisfromcomplexprecursorsbycvditsphysicalandphotocatalyticproperties AT eburkel tio2thinfilmsynthesisfromcomplexprecursorsbycvditsphysicalandphotocatalyticproperties |