Dual subwavelength-grating topology for building polarization beam splitters

A polarization beam splitter (PBS) is key for building polarization-diversity systems in optical communication networks. Here, we propose a compact and easy-to-fabricate PBS based on a dual subwavelength-grating (DSWG) structure positioned between two Si waveguides on a silicon-on-insulator platform...

Full description

Saved in:
Bibliographic Details
Main Author: Chia-Chih Huang
Format: Article
Language:English
Published: IOP Publishing 2025-01-01
Series:JPhys Photonics
Subjects:
Online Access:https://doi.org/10.1088/2515-7647/adaa41
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1832589519040282624
author Chia-Chih Huang
author_facet Chia-Chih Huang
author_sort Chia-Chih Huang
collection DOAJ
description A polarization beam splitter (PBS) is key for building polarization-diversity systems in optical communication networks. Here, we propose a compact and easy-to-fabricate PBS based on a dual subwavelength-grating (DSWG) structure positioned between two Si waveguides on a silicon-on-insulator platform. The coupling strengths of the transverse-electric (TE) and transverse-magnetic (TM) modes were selectively modified, with TE mode suppression and TM mode enhancement. By optimizing the duty cycles along transverse and longitudinal directions of the DSWG structure, the device length is reduced by approximately 40%, and the polarization extinction ratio (PER) of the TM mode is improved by ∼5 dB at a wavelength of 1.55 μ m, compared to a single subwavelength grating structure. Numerical simulations revealed high PERs and low insertion losses (ILs) of 26.7 dB (0.1 dB) for TE mode and 23.2 dB (0.28 dB) for TM mode, with a compact footprint of 1.34 × 2.86 μ m ^2 . Across a bandwidth of ∼90 nm within the C-band (1.53–1.56 μ m), the proposed PBS achieves a TM mode PER of ∼20 dB, a TE mode PER greater than 25 dB, and ILs below 0.25 dB for both modes. This approach, utilizing biaxial anisotropic metamaterials, offers a flexible method for integrating PBSs into photonic integrated circuits using standard semiconductor fabrication processes.
format Article
id doaj-art-09a1c870fd19498bb58ce64cbf75158e
institution Kabale University
issn 2515-7647
language English
publishDate 2025-01-01
publisher IOP Publishing
record_format Article
series JPhys Photonics
spelling doaj-art-09a1c870fd19498bb58ce64cbf75158e2025-01-24T12:56:48ZengIOP PublishingJPhys Photonics2515-76472025-01-017101501410.1088/2515-7647/adaa41Dual subwavelength-grating topology for building polarization beam splittersChia-Chih Huang0https://orcid.org/0000-0003-3015-7386Department of Electronic Engineering, Tungnan University , No.152, Sec. 3, Beishen Rd., Shenkeng Dist., New Taipei City 22202, TaiwanA polarization beam splitter (PBS) is key for building polarization-diversity systems in optical communication networks. Here, we propose a compact and easy-to-fabricate PBS based on a dual subwavelength-grating (DSWG) structure positioned between two Si waveguides on a silicon-on-insulator platform. The coupling strengths of the transverse-electric (TE) and transverse-magnetic (TM) modes were selectively modified, with TE mode suppression and TM mode enhancement. By optimizing the duty cycles along transverse and longitudinal directions of the DSWG structure, the device length is reduced by approximately 40%, and the polarization extinction ratio (PER) of the TM mode is improved by ∼5 dB at a wavelength of 1.55 μ m, compared to a single subwavelength grating structure. Numerical simulations revealed high PERs and low insertion losses (ILs) of 26.7 dB (0.1 dB) for TE mode and 23.2 dB (0.28 dB) for TM mode, with a compact footprint of 1.34 × 2.86 μ m ^2 . Across a bandwidth of ∼90 nm within the C-band (1.53–1.56 μ m), the proposed PBS achieves a TM mode PER of ∼20 dB, a TE mode PER greater than 25 dB, and ILs below 0.25 dB for both modes. This approach, utilizing biaxial anisotropic metamaterials, offers a flexible method for integrating PBSs into photonic integrated circuits using standard semiconductor fabrication processes.https://doi.org/10.1088/2515-7647/adaa41polarization beam splittermetamaterialsphotonic integrated circuits
spellingShingle Chia-Chih Huang
Dual subwavelength-grating topology for building polarization beam splitters
JPhys Photonics
polarization beam splitter
metamaterials
photonic integrated circuits
title Dual subwavelength-grating topology for building polarization beam splitters
title_full Dual subwavelength-grating topology for building polarization beam splitters
title_fullStr Dual subwavelength-grating topology for building polarization beam splitters
title_full_unstemmed Dual subwavelength-grating topology for building polarization beam splitters
title_short Dual subwavelength-grating topology for building polarization beam splitters
title_sort dual subwavelength grating topology for building polarization beam splitters
topic polarization beam splitter
metamaterials
photonic integrated circuits
url https://doi.org/10.1088/2515-7647/adaa41
work_keys_str_mv AT chiachihhuang dualsubwavelengthgratingtopologyforbuildingpolarizationbeamsplitters