Enhanced Temperature Control Method Using ANFIS with FPGA

Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develo...

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Main Authors: Chiung-Wei Huang, Shing-Tai Pan, Jun-Tin Zhou, Cheng-Yuan Chang
Format: Article
Language:English
Published: Wiley 2014-01-01
Series:The Scientific World Journal
Online Access:http://dx.doi.org/10.1155/2014/239261
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author Chiung-Wei Huang
Shing-Tai Pan
Jun-Tin Zhou
Cheng-Yuan Chang
author_facet Chiung-Wei Huang
Shing-Tai Pan
Jun-Tin Zhou
Cheng-Yuan Chang
author_sort Chiung-Wei Huang
collection DOAJ
description Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher.
format Article
id doaj-art-06e8ff3f40df453fac18641f7233eabc
institution Kabale University
issn 2356-6140
1537-744X
language English
publishDate 2014-01-01
publisher Wiley
record_format Article
series The Scientific World Journal
spelling doaj-art-06e8ff3f40df453fac18641f7233eabc2025-02-03T01:21:42ZengWileyThe Scientific World Journal2356-61401537-744X2014-01-01201410.1155/2014/239261239261Enhanced Temperature Control Method Using ANFIS with FPGAChiung-Wei Huang0Shing-Tai Pan1Jun-Tin Zhou2Cheng-Yuan Chang3Department of Electronic Engineering, Chien Hsin University of Science and Technology, Jhongli 320, TaiwanDepartment of Computer Science and Information Engineering, National University of Kaohsiung, Kaohsiung 811, TaiwanDepartment of Electrical Engineering, Chung Yuan Christian University, Jhongli 320, TaiwanDepartment of Electrical Engineering, Chung Yuan Christian University, Jhongli 320, TaiwanTemperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher.http://dx.doi.org/10.1155/2014/239261
spellingShingle Chiung-Wei Huang
Shing-Tai Pan
Jun-Tin Zhou
Cheng-Yuan Chang
Enhanced Temperature Control Method Using ANFIS with FPGA
The Scientific World Journal
title Enhanced Temperature Control Method Using ANFIS with FPGA
title_full Enhanced Temperature Control Method Using ANFIS with FPGA
title_fullStr Enhanced Temperature Control Method Using ANFIS with FPGA
title_full_unstemmed Enhanced Temperature Control Method Using ANFIS with FPGA
title_short Enhanced Temperature Control Method Using ANFIS with FPGA
title_sort enhanced temperature control method using anfis with fpga
url http://dx.doi.org/10.1155/2014/239261
work_keys_str_mv AT chiungweihuang enhancedtemperaturecontrolmethodusinganfiswithfpga
AT shingtaipan enhancedtemperaturecontrolmethodusinganfiswithfpga
AT juntinzhou enhancedtemperaturecontrolmethodusinganfiswithfpga
AT chengyuanchang enhancedtemperaturecontrolmethodusinganfiswithfpga