Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM by Tomoyuki Tsuyama, Tatsuki Oyama, Yu Azuma, Haruhisa Ohashi, Masahiro Irie, Ayumi Yamakawa, Shoko Uetake, Takayuki Konno, Takahiro Ukai, Kohei Ochiai, Nobuyuki Iwaoka, Atsushi Hashimoto, Yoshishige Okuno

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