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    Enhancement of electrical properties of morphotropic phase boundary in Hf1-xZrxO2 films by integrating Mo electrode and TiN interlayer for DRAM capacitors

    Enhancement of electrical properties of morphotropic phase boundary in Hf1-xZrxO2 films by integrating Mo electrode and TiN interlayer for DRAM capacitors by Ju Yong Park, Hyojun Choi, Jaewook Lee, Kun Yang, Sun Young Lee, Dong In Han, Intak Jeon, Chang Hwa Jung, Hanjin Lim, Woongkyu Lee, Min Hyuk Park

    Published 2025-06-01
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