Technological limitations of solid-source chemical vapor deposition of van der Waals heterostructures by Jakub Sitek, Wojciech Sitek, Ben R. Conran, Xiaochen Wang, Clifford McAleese, Anna Kaleta, Slawomir Kret, Iwona Pasternak, Mariusz Zdrojek, Wlodek Strupinski

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