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    Highly uniform thermally undercut silicon photonic devices in a 300 mm CMOS foundry process

    Highly uniform thermally undercut silicon photonic devices in a 300 mm CMOS foundry process by Robert Parsons, Kaylx Jang, Yuyang Wang, Asher Novick, A. Matthew Smith, Christopher C. Tison, Yonas Gebregiorgis, Venkatesh Deenadayalan, Matthew van Niekerk, Lewis Carpenter, Tat Ngai, Gerald Leake, Daniel Coleman, Xiang Meng, Stefan Preble, Michael L. Fanto, Keren Bergman, Anthony Rizzo

    Published 2025-08-01
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