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    Hydrosilane‐Functionalized [2.2]Paracyclophane for Plasma‐Etch‐Resistant and Post‐Modifiable Poly(Para‐Xylylene)

    Hydrosilane‐Functionalized [2.2]Paracyclophane for Plasma‐Etch‐Resistant and Post‐Modifiable Poly(Para‐Xylylene) by Lukas Bichlmaier, Tetsuhiko F. Teshima, Arseni Kostenko, George Al Boustani, Rebecca Wilhelm, Sebastian Stigler, Shuma Tanaka, Hiroaki Onoe, Bernhard Wolfrum, Shigeyoshi Inoue

    Published 2025-03-01
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