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  1. 1
    Study on Self-Sharpening Mechanism and Polishing Performance of Triethylamine Alcohol on Gel Polishing Discs

    Study on Self-Sharpening Mechanism and Polishing Performance of Triethylamine Alcohol on Gel Polishing Discs by Yang Lei, Lanxing Xu, Kaiping Feng

    Published 2025-07-01
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  2. 2
    Investigation the CMP process of 6 H-SiC in H2O2 solution with ReaxFF molecular dynamics simulation

    Investigation the CMP process of 6 H-SiC in H2O2 solution with ReaxFF molecular dynamics simulation by Yanzhang Gu, Kaiping Feng, Lanxing Xu, Liang Zhao, Tianchen Zhao, Binghai Lyu

    Published 2025-01-01
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