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    Effect of La and Si additives in Zr-doped HfO2 capacitors for pseudo-linear high-κ dielectric applications

    Effect of La and Si additives in Zr-doped HfO2 capacitors for pseudo-linear high-κ dielectric applications by Minjong Lee, Yong Chan Jung, Jin-Hyun Kim, Dushyant M. Narayan, Sehun Kang, Woo Young Park, Kivin Im, Jiyoung Kim

    Published 2025-03-01
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