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    Gate Stack Engineering and Thermal Treatment on Electrical and Interfacial Properties of Ti/Pt/HfO2/InAs pMOS Capacitors

    Gate Stack Engineering and Thermal Treatment on Electrical and Interfacial Properties of Ti/Pt/HfO2/InAs pMOS Capacitors by Chung-Yen Chien, Jei-Wei Hsu, Pei-Chin Chiu, Jen-Inn Chyi, Pei-Wen Li

    Published 2012-01-01
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