Enhanced etch characteristics of EUV PR masked SiON through the ion beam grid pulsing technique by Hae In Kwon, Yun Jong Jang, Kyoung Chan Kim, Hong Seong Gil, Ju Young Kim, Seong Hyun Ryu, Do Seong Pyun, Dae Whan Kim, Woo Chang Park, Ji Yeon Lee, Jin Woo Park, Sang Wuk Park, Geun Young Yeom

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