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    Removal of diclofenac from aqueous media by UV/TiO2 process in a fixed-bed batch photoreactor: Optimization by response surface methodology

    Removal of diclofenac from aqueous media by UV/TiO2 process in a fixed-bed batch photoreactor: Optimization by response surface methodology by Aysan Rahimpour-Javid

    Published 2024-12-01
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